---
title: 6. Basic of critical angle for channeling ion implantation
description: Ion Technology Center is a professional group that specializes in Ion Implantation, Material Analysis, and R&D consulting and technical support. As a state-of-the-art laboratory equipped with cutting-edge technology and facilities, we aim to be a valuable partner for businesses and university researchers, meeting the demands of the times.
---

[News ](https://iontc.co.jp/en/news)

# [6. Basic of critical angle for channeling ion implantation](https://iontc.co.jp/en/news/6.-basic-of-critical-angle-for-channeling-ion-implantation)

 Written by [Ion Technology Center](https://iontc.co.jp/en/news/author/ion-technology-center) | Aug 24, 2025 8:12:45 AM

This article explains the critical angle, a fundamental aspect of the channeling phenomenon. When ions are incident at an angle close to parallel to the crystal axis, they penetrate deeper due to the channeling phenomenon, but as the incident angle to the crystal axis increases, channeling is inhibited. This article mainly uses diagrams to explain the critical angle, which indicates how much tilt in the incident angle is allowed.

>[Basic of critical angle for channeling ion implantation](https://iontc.co.jp/hubfs/Basic%20of%20critical%20angle%20for%20channeling%20ion%20implantation-1.pdf)

 

Our paper on channeling ion implantation into GaN was published in JJAP in August 2025, and please refer to it.  
Reference article: [Paper published in Japanese Journal of Applied Physics (JJAP)](https://iontc.co.jp/en/news/19-aug-2025-paper-published-in-japanese-journal-of-applied-physics-jjap)

[View full post](https://iontc.co.jp/en/news/6.-basic-of-critical-angle-for-channeling-ion-implantation)

```json
{
  "@context" : "http://schema.org",
  "@type" : "BlogPosting",
  "author" : {
    "@type" : "Person",
    "name" : "Ion Technology Center"
  },
  "dateModified" : "2025-08-25T03:04:25.602Z",
  "datePublished" : "2025-08-24T08:12:45Z",
  "headline" : "6. Basic of critical angle for channeling ion implantation",
  "image" : {
    "@type" : "ImageObject",
    "height" : 140,
    "url" : "https://43325678.fs1.hubspotusercontent-na1.net/hubfs/43325678/assets/images/news/60_itc_logo.jpg",
    "width" : 280
  },
  "mainEntityOfPage" : "https://iontc.co.jp/en/news/6.-basic-of-critical-angle-for-channeling-ion-implantation",
  "publisher" : {
    "@type" : "Organization",
    "logo" : {
      "@type" : "ImageObject",
      "height" : 60,
      "url" : "/hs/hsstatic/content_shared_assets/static-1.4092/img/default-amp-logo.png",
      "width" : 60
    },
    "name" : "[en] News"
  }
}
```