We will present our work on Mg channeled implantation into GaN(0001) at CSW2026 (Compound Semiconductor Week).
【Conference Schedule】
May 24 (Sun) – May 28 (Thu), 2026
【Venue】
Kumamoto-Jo Hall, Kumamoto, Japan
【Presentation Details】
Date & Time: Thursday, May 28, 2026, 11:30–11:45
【Title】
Channeled implantation of Mg ions into homoepitaxial and heteroepitaxial GaN(0001)
【Website】
https://csw-jpn.org/
Presentation Overview
Ion Technology Center has been conducting research on channeled ion implantation by leveraging our expertise in ion implantation and simulation. In this oral presentation, we will introduce our latest findings on how tilt angle, Mg dose and dislocations affect Mg channeled implantation into GaN(0001).